长垣产业园区科技文献服务平台

期刊


ISSN0914-4935
刊名Sensors and materials
参考译名传感器与材料
收藏年代1998～2023



全部

1998 1999 2000 2001 2002 2003
2004 2005 2006 2007 2008 2009
2010 2011 2012 2013 2014 2015
2016 2017 2018 2019 2020 2021
2022 2023

2021, vol.33, no.1 Pt.1 2021, vol.33, no.1 Pt.2 2021, vol.33, no.1 Pt.3 2021, vol.33, no.10 Pt.1 2021, vol.33, no.10 Pt.2 2021, vol.33, no.10 Pt.3
2021, vol.33, no.11 Pt.1 2021, vol.33, no.11 Pt.2 2021, vol.33, no.11 Pt.3 2021, vol.33, no.12 Pt.1 2021, vol.33, no.12 Pt.2 2021, vol.33, no.12 Pt.3
2021, vol.33, no.12 Pt.4 2021, vol.33, no.12 Pt.5 2021, vol.33, no.2 Pt.1 2021, vol.33, no.2 Pt.2 2021, vol.33, no.2 Pt.3 2021, vol.33, no.3 Pt.1
2021, vol.33, no.3 Pt.2 2021, vol.33, no.3 Pt.3 2021, vol.33, no.4 Pt.1 2021, vol.33, no.4 Pt.2 2021, vol.33, no.4 Pt.3 2021, vol.33, no.5 Pt.1
2021, vol.33, no.5 Pt.2 2021, vol.33, no.5 Pt.3 2021, vol.33, no.6 Pt.1 2021, vol.33, no.6 Pt.2 2021, vol.33, no.6 Pt.3 2021, vol.33, no.6 Pt.4
2021, vol.33, no.7 Pt.1 2021, vol.33, no.7 Pt.2 2021, vol.33, no.7 Pt.3 2021, vol.33, no.8 Pt.1 2021, vol.33, no.8 Pt.2 2021, vol.33, no.8 Pt.3
2021, vol.33, no.8 Pt.4 2021, vol.33, no.9 Pt.1 2021, vol.33, no.9 Pt.2 2021, vol.33, no.9 Pt.3 2021, vol.33, no.9 Pt.4

题名作者出版年年卷期
Novel Intensity-demodulated Fiber-optic Refractive Index Sensor Based on Splicing Point Tapered FiberLiangquan Zhu; Qijing Lin; Fuzheng Zhang; Feng Han; Man Zhao; Ping Yang; Zhuangde Jiang20212021, vol.33, no.6 Pt.3
Fabrication and Characterization of High-frequency Vibration Sensor over 6 kHz with Potential for Energy HarvestingLan Zhang; Ryohei Takei; Jian Lu; Daiji Noda; Ryo Ohta; Takeshi Kobayashi; Toshihiro Itoh20212021, vol.33, no.6 Pt.3
Improved Method of Bluetooth-low-energy-based Location Tracking Using Neural NetworksSungkwan Youm; Kwang-Seong Shin20212021, vol.33, no.6 Pt.3
Feature Reduction Method Coupled with Electronic Nose for Quality Control of TeaChao Wang; Jizheng Yang; Junhui Wu20212021, vol.33, no.6 Pt.3
Radiation and Spontaneous Annealing of Radiation-sensitive Field-effect Transistors with Gate Oxide Thicknesses of 400 and 1000 nmGoran S. Ristic; Marko S. Andjelkovic; Russell Duane; Alberto J. Palma; Aleksandar B. Jaksic20212021, vol.33, no.6 Pt.3



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