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2001, vol.13, no.1	2001, vol.13, no.2	2001, vol.13, no.3	2001, vol.13, no.4	2001, vol.13, no.5	2001, vol.13, no.6
2001, vol.13, no.7	2001, vol.13, no.8

题名	作者	出版年	年卷期
Realistic step flow model for orientation-dependent wet etching implemented in a modular TCAD environment	Anton Horn; Franz Wittmann; Gerhard Wachutka	2001	2001, vol.13, no.6
The structure of an underetched convex mask corner explained as the evolution of a saddlepoint vertex	Jaap Van Suchtelen; Erik Van Veenedaal	2001	2001, vol.13, no.6
Monte Carlo simulation of wet chemical etching of silicon	Erik Van Veenendaal; Jaap van Suchtelen; Paul Van Beurden; Herma M. Cuppen; Willem J. P. van Knckevort; A. Jasper Nijdam; Miko Elwenspoek; Elias Vlieg	2001	2001, vol.13, no.6
Application of dual-doped TMAH silicon etchant in the fabrication of a micromachined aluminum flexing beam actuator	John Garra; Sebastiano Brida; Lorenza Ferravio; Makarand Paranjape	2001	2001, vol.13, no.6
Optochemical sensor for HCl gas based on tetraalkoxyphenylporphyrin dispersed in an acrylate polymer matrix	Heru Supriyatno; Katsuhiko Nakagawa; Yoshihiko Sadaoka	2001	2001, vol.13, no.6