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期刊


ISSN1533-4880
刊名Journal of Nanoscience and Nanotechnology
参考译名纳米科学与纳米技术杂志
收藏年代2004～2021



全部

2004 2005 2006 2007 2008 2009
2010 2011 2012 2013 2014 2015
2016 2017 2018 2019 2020 2021

2011, vol.11, no.1 2011, vol.11, no.10 2011, vol.11, no.11 2011, vol.11, no.12 2011, vol.11, no.2 2011, vol.11, no.3
2011, vol.11, no.4 2011, vol.11, no.5 2011, vol.11, no.6 2011, vol.11, no.7 2011, vol.11, no.8 2011, vol.11, no.9

题名作者出版年年卷期
Atmospheric Pressure Chemical Vapor Infiltration (CVI) for the Preparation of Biomorphic SiC Ceramics Derived from PaperChristian Pflitsch; Benjamin Curdts; Burak Atakan20112011, vol.11, no.9
Carburization of Si Microwires by Chemical Vapour DepositionM. Ollivier; L. Latu-Romain; A. Mantoux; E. Bano; T. Baron20112011, vol.11, no.9
Impedance Spectroscopy of Manganite Films Prepared by Metalorganic Chemical Vapor DepositionToshihiro Nakamura; Kohei Homma; Kunihide Tachibana20112011, vol.11, no.9
Non-Thermal Atmospheric Pressure Plasma Etching of F:SnO_2 for Thin Film PhotovoltaicsJ. L. Hodgkinson; M. Thomson; I. Cook; D. W. Sheel20112011, vol.11, no.9
Single-Step Fabrication of Nanolamellar Structured Oxide Ceramic Coatings by Metal-Organic Chemical Vapor DepositionNadine K. Eils; Peter Mechnich; Hartmut Keune; Georg Wahl; Claus-Peter Klages20112011, vol.11, no.9
Fluidized Bed Chemical Vapor Deposition of Silicon on Carbon Nanotubes for Li-Ion BatteriesNicolas Coppey; Laure Noe; Marc Monthioux; Brigitte Caussat20112011, vol.11, no.9
Amorphous Alumina Coatings: Processing, Structure and Remarkable Barrier PropertiesDiane Samelor; Ana-Maria Lazar; Maelenn Aufray; Claire Tendero; Loic Lacroix; Jean-Denis Beguin; Brigitte Caussat; Hugues Vergnes; Joel Alexis; Dominique Poquillon; Nadine Pebere; Alain Gleizes; Constantin Vahlas20112011, vol.11, no.9
Conformal Atomic Layer Deposition of TA-Based Diffusion Barrier Film Using a Novel Mono-Guanidinate PrecursorT. Prieur; V. Brize; T. Cornier; B. Doisneau; A. Farcy; R. Boichot; A. Mantoux; S. Daniele; E. Blanquet20112011, vol.11, no.9
Atomic Layer Deposition of Ruthenium Films on Strontium TitanateKaupo Kukli; Marianna Kemell; Jun Lu; Lars Hultman; Stefan Riedel; Jonas Sundqvist; Mikko Ritala; Markku Leskela20112011, vol.11, no.9
Low Temperature SiC Film Deposition Using Trichlorosilane Gas and Monomethylsilane GasHitoshi Habuka; Yusuke Ando20112011, vol.11, no.9
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