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期刊


ISSN1340-2625
刊名まてりあ
参考译名金属
收藏年代1998~2023



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2001, vol.40, no.1 2001, vol.40, no.10 2001, vol.40, no.11 2001, vol.40, no.12 2001, vol.40, no.2 2001, vol.40, no.3
2001, vol.40, no.4 2001, vol.40, no.5 2001, vol.40, no.6 2001, vol.40, no.7 2001, vol.40, no.8 2001, vol.40, no.9

题名作者出版年年卷期
Si twinning superlatticeHiroki Hibino; Toshio Ogino20012001, vol.40, no.12
Self-organization of Ge islands on SiHiroo Omi; Toshio Ogino20012001, vol.40, no.12
Direct atomistic observation of reactions in metal/semiconductor Interfaces by STEMNobuo Tanaka; Shigeaki Zaima; Yukio Yasuda20012001, vol.40, no.12
Elemental analysis of O-N-O dielectric in um-scaleTetsuo Oikawa; Masahiro Kawasaki20012001, vol.40, no.12
Nano-scale defect analysis of gate leak in semiconductor device by FIB and TEMNaoko Kato; Juichi Matsuzawa; Yoshiteru Kohno; Hiroyasu Saka20012001, vol.40, no.12
Interfacial phenomena of a-Si thin film transistor during TEM observationKotaro Kuroda; Hiroyasu Saka; Satoshi Tsuji20012001, vol.40, no.12
Atomic structure at a SiO{sub}2/Si interfaceKoji Watanabe; Yoshiyuki Miyamoto; Nobuyuki Ikarahi20012001, vol.40, no.12
Cross-sectional TEM analysis of packaging technology for LCDKatsuhiro Tsujimoto; Satoshi Tsuji; Kotaro Kuroda; Hiroyasu Saka20012001, vol.40, no.12
Relation between Schottky barrier height and crystalline alignment of Al films on Si substratesYoshinao Miura; Shinji Fujieda; Kazuyuki Hirose20012001, vol.40, no.12
Direct Epi-CoSi{sub}2 formation form Co/intermediate layer/(100)SiShinichi Ogawa20012001, vol.40, no.12
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