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期刊


ISSN0913-5685
刊名電子情報通信学会技術研究報告
参考译名电子信息通信学会技术研究报告：元件和材料
收藏年代2000～2023



全部

2000 2001 2002 2013 2015 2020
2021 2022 2023

2000, vol.100, no.141 2000, vol.100, no.271 2000, vol.100, no.272 2000, vol.100, no.320 2000, vol.100, no.371 2000, vol.100, no.395
2000, vol.100, no.396 2000, vol.100, no.485 2000, vol.100, no.486

题名作者出版年年卷期
Growth process of Ge film on Si substrates and Si/Ge superlattices by ion beam sputteringYukihiro Takahashi; Masafumi Kaimori; Kimihiro Sasaki; Tomonobu Hata20002000, vol.100, no.395
Growth and electric properties of selective B dope Si/Ge periodic structure prepared by ion beam sputteringMasafumi Kaimori; Yukihiro Takahashi; Yasunori Nabetani; Kimihiro Sasaki; Tomonobu Hata20002000, vol.100, no.395
MBE growth of Si{sub}0.75Ge{sub}0.25 alloys using short-period (Si{sub}m/Ge{sub}n){sub}N superlattices on Si(001) substrateM. M. Rahman; H. Matada; T. Tambo; C. Tatsuyama20002000, vol.100, no.395
Heteroepitaxial growth of Bi{sub}2Sr{sub}2CuO{sub}x thin films on Si(001)Toyokazu Tambo; Atsushi Shimizu; Akiyoshi Matsuda; Chiei Tatsuyama20002000, vol.100, no.395
Evaluation of ultra thin AlN epitaxial-layer on NbN by noise and tunnel spectroscopiesN. Masumoto; H. Ishida; A. Saito; K. Hamasaki; Z. Wang20002000, vol.100, no.395
Sequential epitaxial growth of (111)Cu/(111)HfN bilayered film on (111)Si and diffusion barrier property of (111)HfN filmSatoko Shinkai; Katsutaka Sasaki20002000, vol.100, no.395
Formation of YSZ ultrathin film for gate insulator by metallic/oxide mode depositionKenji Sasaki; Tatsuhiro Hasu; Kimihiro Sasaki; Tomonobu Hata20002000, vol.100, no.395
Control of reflected light in Ta{sub}2O{sub}5 optical wave-guide device by nematic liquid crystal cellYuka Matsubayashi; Eiji Itoh; Keiichi Miyairi20002000, vol.100, no.395
Bulk acoustic wave resonators using ZnO piezoelectric thin films - challenges of zero temperature characteristics of frequency in various frequency rangesYukio Yoshino; Masaki Takeuchi; Kazuhiro Inoue; Takahiro Makino; Seiichi Arai20002000, vol.100, no.395
Low-temperature deposition of ITO thin films by sputter-beam depositionTakakazu Kiyomura; Ryoma Ohki; Yoichi Hoshi20002000, vol.100, no.395



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