长垣产业园区科技文献服务平台 | cy.gmachineinfo.com

期刊

全部

2002, vol.14, no.1	2002, vol.14, no.2	2002, vol.14, no.3	2002, vol.14, no.4	2002, vol.14, no.5	2002, vol.14, no.6
2002, vol.14, no.7	2002, vol.14, no.8

题名	作者	出版年	年卷期
Characteristics of plasmaless dry etching of silicon-related materials using chlorine trifluoride gas	Yoji Saito	2002	2002, vol.14, no.5
Silicon dioxide micropillars for sieving fabricated by macroporous silicon-based micromachining	Shinichi Izuo; Hiroshi Ohji; Patrick J. French; Kazuhiko Tsutsumi; Masafumi Kimata	2002	2002, vol.14, no.5
High-sensitivity hybrid hall effect ICs with thin film hall elements	Kazutoshi Ishibashi; Ichiro Okada; Ichiro Shibasaki	2002	2002, vol.14, no.5
Heteroepitaxial growth of GaN on γ-Al{sub}2O{sub}3/Si substrate by organometallic vapor phase epitaxy	Akihiro Wakahara; Nobuharu Kawamura; Hiroshi Oishi; Hiroshi Okada; Akira Yoshida; Makoto Ishida	2002	2002, vol.14, no.5
Growth-mode control in sublimation epitaxy of AlN	Tomoaki Furusho; Shigehiro Nishino	2002	2002, vol.14, no.5
Influence of initial layers on crystallinity of NiO(111) epitaxial film grown at room temperature by pulsed laser deposition	Yoshiharu Kakehi; Satoru Nakao; Kazuo Satoh; Tadaoki Kusaka	2002	2002, vol.14, no.5