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期刊


ISSN0013-4686
刊名Electrochimica Acta
参考译名国际电化学杂志：电化学学报
收藏年代1998～2024



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1998 1999 2000 2001 2002 2003
2004 2005 2006 2007 2008 2009
2010 2011 2012 2013 2014 2015
2016 2017 2018 2019 2020 2021
2022 2023 2024

2005, vol.50, no.10 2005, vol.50, no.11 2005, vol.50, no.12 2005, vol.50, no.13 2005, vol.50, no.14 2005, vol.50, no.15
2005, vol.50, no.16-17 2005, vol.50, no.18 2005, vol.50, no.19 2005, vol.50, no.20 2005, vol.50, no.21 2005, vol.50, no.22
2005, vol.50, no.23 2005, vol.50, no.24 2005, vol.50, no.25-26 2005, vol.50, no.27 2005, vol.50, no.28 2005, vol.50, no.5
2005, vol.50, no.6 2005, vol.50, no.7-8 2005, vol.50, no.9 2005, vol.51, no.1 2005, vol.51, no.2 2005, vol.51, no.3
2005, vol.51, no.4 2005, vol.51, no.5 2005, vol.51, no.6

题名作者出版年年卷期
MOCVD of hard metallurgical coatings: Examples in the Cr-C-N systemF. Maury20052005, vol.50, no.23
Characterization of composite titanium nitride coatings prepared by reactive plasma sprayingG. M. Ingo; S. Kaciulis; A. Mezzi; T. Valente; F. Casadei; G. Gusmano20052005, vol.50, no.23
Properties of electrodeposited nanocrystalline Ni-B alloy filmsK. H. Lee; D. Chang; S. C. Kwon20052005, vol.50, no.23
Tribological study of Ni matrix composite coatings containing nano and micro SiC particlesP. Gyftou; M. Stroumbouli; E. A. Pavlatou; P. Asimidis; N. Spyrellis20052005, vol.50, no.23
Corrosion and wear resistant electrodeposited composite coatingsMaria Lekka; Niki Kouloumbi; Mauro Gajo; Pier Luigi Bonora20052005, vol.50, no.23
Phase structure of electrodeposited alloysP. L. Cavallotti; L. Nobili; A. Vicenzo20052005, vol.50, no.23
Materials computation towards technological impact: The multiscale approach to thin films depositionCarlo Cavallotti; Marco Di Stanislao; Davide Moscatelli; Alessandro Veneroni20052005, vol.50, no.23
Development of high-performance magnetic thin film for high-density magnetic recordingTetsuya Osaka; Toru Asahi; Jun Kawaji; Tokihiko Yokoshima20052005, vol.50, no.23
Silver nanostructured catalyst for modification of dielectrics surfaceAlgirdas Vaskelis; Aldona Jagminiene; Loreta Tamasauskaite-Tamasiunaite; Remigijus Juskenas20052005, vol.50, no.23
MOCVD deposition of CoAl{sub}2O{sub}4 filmsG. Carta; M. Casarin; N. El Habra; M. Natali; G. Rossetto; C. Sada; E. Tondello; P. Zanella20052005, vol.50, no.23
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