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0915-1869
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表面技術
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表面技术
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2003, vol.54, no.1
2003, vol.54, no.10
2003, vol.54, no.11
2003, vol.54, no.12
2003, vol.54, no.5
2003, vol.54, no.9
题名
作者
出版年
年卷期
Processing of Transparent Super-Hydrophobic Polymer Film by Screen Printing Method
Koji TAKEDA; Tsutomu KURAMOCHI; Tomoaki NOZAWA; Nobuo KIEDA; Keiichi KATAYAMA; Akira NAKAJIMA
2003
2003, vol.54, no.10
Improvements of Via-Filling in Neutral Electroless Copper Plating for ULSI Metallization
Hidemi NAWAFUNE; Shingo HIGUCHI; Kensuke AKAMATSU; Ei UCHIDA
2003
2003, vol.54, no.10
Synthesis of Diamond on Iron Substrate by Hot-Filament CVD
Yutaka ISHIKAWA; Yutaka SASAKI
2003
2003, vol.54, no.10
Pulse Electrochemical Etching of NiTi Shape Memory Alloy in LiCl-Ethanol Electrolyte
Takashi MINETA
2003
2003, vol.54, no.10
Growth Manner of Silica Film on Polyethylene Terephthalate Substrates in Plasma-Enhanced Chemical Vapor Deposition
Katsuya TESHIMA; Yasushi INOUE; Hiroyuki SUGIMURA; Osamu TAKAI
2003
2003, vol.54, no.10
The Surface Modification of Lead Using Electrochemical Potential Sweep Technique
Akihiko HIROTA; Yoshiaki ARAI; Shigeo SATO; Seiji KAMASAKI
2003
2003, vol.54, no.10
Effects of Various Additives on the Characteristics of Electroplated Nickel Thin Films
Keisuke KISHIMOTO; Shinji YOSHIOKA; Koichi KOBAYAKAWA; Yuichi SATO
2003
2003, vol.54, no.10
The Decline of the Friction Coefficient of Electroless Plated Composite Films by the Addition of Hydrophilic Carbon Black Particles to the Bath
Yukie MISHIBA; Yuma SAKAI; Sachio YOSHIHARA; Takashi SHIRAKASHI; Akira KUWANA
2003
2003, vol.54, no.10
Copper Plating Using Gel Electrolyte III. Electrodeposition of Copper from Thin Film of Gel Electrolyte
Masayuki ITAGAKI; Ken-ichi SHIMODA; Kunihiro WATANABE; Kazuya YASUDA
2003
2003, vol.54, no.10
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