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2002, vol.122-E, no.1	2002, vol.122-E, no.10	2002, vol.122-E, no.11	2002, vol.122-E, no.2	2002, vol.122-E, no.3	2002, vol.122-E, no.4
2002, vol.122-E, no.5	2002, vol.122-E, no.6	2002, vol.122-E, no.7	2002, vol.122-E, no.8	2002, vol.122-E, no.9

题名	作者	出版年	年卷期
Development of deep reactive ion etching (deep-RIE) process for bonded silicon-glass structures	Yukihisa Yoshida; Munehito Kumagai; Jun-ichi Ichikawa; Jiwei Jiao; Kazuhiko Tsutsumi	2002	2002, vol.122-E, no.8
Fabrication of diffractive optical elements on a Si chip by imprint lithography using novel mold	Yoshihiko Hirai; Masato Okano; Hiroyuki Okuno; Hiroshi Toyota; Hisao Kikuta; Yoshio Tanaka	2002	2002, vol.122-E, no.8
Fine pattern fabrication on a polymer plate by direct imprint lithography	Yoshihiko Hirai; Nobuyuki Takagi; Satoshi Harada; Yoshio Tanaka	2002	2002, vol.122-E, no.8
Ultra-fine pitch electrical feed through using Si deep etching and bonding wafer	Takaaki Suzuki; Kazuyoshi Uchino; Tetsurou Yokoi; Yumen Rai; Hiroyuki Takizawa; Ryutaro Maeda; Hideki Takagi; Koutarou Hanada	2002	2002, vol.122-E, no.8
Micro-hole fabrication using a silicon-mold	Manabu Yasui; Kuniyuki Kakushima; Yasuo Hirabayashi; Makoto Mita; Hiroyuki Fujita	2002	2002, vol.122-E, no.8