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期刊


ISSN0915-1869
刊名表面技術
参考译名表面技术
收藏年代1998～2025



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2000, vol.51, no.1 2000, vol.51, no.10 2000, vol.51, no.11 2000, vol.51, no.12 2000, vol.51, no.2 2000, vol.51, no.3
2000, vol.51, no.4 2000, vol.51, no.5 2000, vol.51, no.6 2000, vol.51, no.7 2000, vol.51, no.8 2000, vol.51, no.9

题名作者出版年年卷期
Adsorption behavior of polyphosphate-zinc inhibitor for cooling systemsJunichi Nakajima; Ryuji Tsuchiya; Naoko Togo; Kenichi Ito; Ryoichi Ichino; Masazumi Okido20002000, vol.51, no.9
Application of silicon etchingMasayoshi Esashi; Takahito Ono; Shuji Tanaka20002000, vol.51, no.9
Continuous horizontal plating equipment for PCBMasaaki Takahashi20002000, vol.51, no.9
Dry etching technology of poly-Si for silicon LSI devicesNobuo Fujiwara20002000, vol.51, no.9
Effects of gelatine and chloride ion on copper electrodeposition IINobuyuki Koura; Yoshinori Eijiri; Motoyuki Mamiya; Yasushi Idemoto; Futoshi Matsumoto20002000, vol.51, no.9
Etched layer structure produced by AC etching of aluminum in hydrochloric acid solutionEiichi Suganuma; Yuji Tanno; Akira Funakoshi20002000, vol.51, no.9
In-depth characterization of oxide layers formed on stainless steelYasuko Furunushi20002000, vol.51, no.9
MicroactuatorHiroyuki Fujita20002000, vol.51, no.9
Optimization of the ratio of drive frequency to capacitance of barrier layer in air barrier discharge at atmospheric pressureKazuhiro Fukushima; Masamori Ichiyama; Naoto Kikuchi; Eiji Kusano; Hidehito Nanto; Akira Kinbara20002000, vol.51, no.9
Photoelectrochemical response of TiO{sub}2 prepared from thermal oxidation of Ti in HNO{sub}3 aqueous solution containing Pb{sup}(2+) ionsYasuhisa Maeda; Yasuhiro Iwasaki; Norihiro Yamamoto20002000, vol.51, no.9
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