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ISSN
0915-1869
刊名
表面技術
参考译名
表面技术
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2000, vol.51, no.1
2000, vol.51, no.10
2000, vol.51, no.11
2000, vol.51, no.12
2000, vol.51, no.2
2000, vol.51, no.3
2000, vol.51, no.4
2000, vol.51, no.5
2000, vol.51, no.6
2000, vol.51, no.7
2000, vol.51, no.8
2000, vol.51, no.9
题名
作者
出版年
年卷期
Boriding of nickel alloys by powder-pack method
Nobuhiro Ueda; Takumi Sone; Tomoyuki Mizukoshi; Akira Ikenaga; Makoto Kawamoto
2000
2000, vol.51, no.8
Characterization of anisotropic wet etching properties of single-crystal silicon by using hemispherical specimen
Mitsuhiro Shikida
2000
2000, vol.51, no.8
Conversion coating of zinc electrodeposit using by Cr (III) and its corrosion resistance
Hiroomi Noguchi; Junko Yoshino; Yoshiki Mazuda
2000
2000, vol.51, no.8
Copper sheet with artificial patina
Kazushige Morimoto; Syuichi Yamasaki
2000
2000, vol.51, no.8
Effects of small amount of impurities on etching of silicon
Hiroshi Tanaka; Kazuyuki Inoue
2000
2000, vol.51, no.8
Etching processes of semiconductor of Si with atomic resolution
Kingo Itaya
2000
2000, vol.51, no.8
Evaluation of degradation behavior of protective coatings by scanning acoustic microscopy (part 2): comparison of various coatings
Yukihiro Sekiyama; Norimitsu Hirose; Isao Sekine; Toshiyuki Tanaki; Makoto Yuasa
2000
2000, vol.51, no.8
Hydrophobicity of TiO{sub}2 with vinyltriethoxysilane
Sumiko Sanuki; Yoshihiko Nishi; Kiyoshi Nakahara; Hiroshi Majima
2000
2000, vol.51, no.8
New trend of construction materials in architectural design
Isao Hashimoto
2000
2000, vol.51, no.8
Observation of real metal surfaces by temperature programmed photoelectron emission technique -temperature dependence of the amount of emitted electrons and its relationship to XPS analysis-
Tokirou Kamosawa; Masakazu Honma; Yoshihiro Momose
2000
2000, vol.51, no.8
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