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1998, vol.10, no.1	1998, vol.10, no.2	1998, vol.10, no.3	1998, vol.10, no.4	1998, vol.10, no.5	1998, vol.10, no.6
1998, vol.10, no.7	1998, vol.10, no.8

题名	作者	出版年	年卷期
Anisotropic etching of silicon in saturated TMAHW solutions for IC-compatible micromachining	P. M. Sarro; S. Brida; C. M. A. Ashruf, W. v. d. Vlist; H. v. Zeijl	1998	1998, vol.10, no.4
Chemically amplified deep UV resists for micromachining using electron beam lithography and dry etching	P. Hudek; I. W. Rangelow; I. Kostic; G. Stangl; P. B. Grabiec; E. W. Rangelow; Miro Belov; Feng shi	1998	1998, vol.10, no.4
Power sensor microsystem technology and characterization	T. Lalinsky; S. Hascik; Z. Mozolova; J. Kuzmik; Z. Hatzopoulos	1998	1998, vol.10, no.4
Supported BLM microprobe with thin-film Ag/AgCl reference electrode for pH measurements	V. Rehacek; I. Novotny; V. Tvarozek; F. Mika; W. Ziegler; A. Ottova-Leitmannova; H. Ti Tien	1998	1998, vol.10, no.4
Wet etching of InGaP and GaAs in HCl: H{sub}3PO{sub}4: H{sub}2O{sub}2	J. Skriniarova; J. Kovac; J. Breza; D. Gregusova	1998	1998, vol.10, no.4